Growth characteristics of MoS2 coatings prepared by unbalanced bipolar DC magnetron sputtering① (2005年)

时间:2024-05-12 03:25:19
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文件名称:Growth characteristics of MoS2 coatings prepared by unbalanced bipolar DC magnetron sputtering① (2005年)

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更新时间:2024-05-12 03:25:19

工程技术 论文

MoS2 coatings were prepared by unbalanced bipolar DC magnetron sputtering under different argon pressures and for different deposition times, and the structure and morphology of MoS2 coatings were determined and observed respectively by X-ray diffractome


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