文件名称：Structural and physical properties of permalloy thin films prepared by DC magnetron sputtering at different substrate temperature (2004年)
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更新时间：2024-05-12 02:01:07
工程技术 论文
Abstracts: Permalloy Ni80Fe20 films have been grown on thermal oxidized Si (111) wafers by magnetron sputtering at well-controlled substrate temperatures of 300, 500, 640 and 780 K in 0.65 Pa argon pressure. The base pressure was about 1?10-4 Pa. The depo