文件名称：二元钒合金上金属氧化物薄膜的电子特性
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更新时间：2024-07-19 14:21:43
学术 论文
Electronic Properties of Metallic Oxide Films on Binary Vandium Alloys Electronic Properties of Metallic Oxide Films on Binary Vandium Alloys Torsten Bachmann, Winfried Vonau* Kurt-Schwabe-Institut für Mess- und Sensortechnik Meinsberg e.V., Fabrikstraße 69, D-04720 Ziegra-Knobelsdorf Keywords: Semiconductors; Thin films; Alloys The passive films on metallic titanium and on binary vanadium- titanium were prepared electrochemically in 5 M sulfuric acid at 298 K for a constant time of 900 s. T