文件名称：Optical Lithography: Here is Why
文件大小：30.85MB
文件格式：PDF
更新时间：2022-03-01 08:44:27
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This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future. Topics include: - Exposure Systems - Image Formation - The Meter of Lithography - Components in Optical Lithography - Processing and Optimization - Immersion Lithography - Outlook for optical lithography