Molecular Theory of Lithography

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文件名称：Molecular Theory of Lithography
文件大小：25.41MB
文件格式：PDF
更新时间：2022-03-01 06:39:30
光刻 The science and technology of lithography, especially advanced semiconductor lithography, have now reached such an advanced stage of development and promise such numerous applications (as evidenced by the numerous technologies that the field is now enabling—from electronics to photonics, catalysis to medicine, energy transduction and storage to sensing) that there is a need for a single, reasonably complete, unified exposition of the molecular theory that underlies lithographic imaging. This book is intended to fill this need. It attempts to systematically explain with physical-chemical theories the molecular-level interactions that underlie the essential aspects of lithographic imaging phenomena. The effects of such molecular-level interactions become all the more heightened in the regime of single-digit to a few tens of nanometer-patterned feature length scales, a regime that overlaps the radius of gyration of the resist polymers used in the patterning. In addition, the book will provide the theoretical basis for the main unit operations of the advanced lithographic process, as well as for advanced lithographic imaging mechanisms, including photochemical and radiochemical, imprint, and directed selfassembly imaging mechanisms.